name:Suzhou Cycas microelectronics co.,ltd
Contact person:Mrs guan 18951133367
Tel:0512-58987901
Fax:0512-58987201
E-mail:sales@cycas.com
address:张家港经济开发区福兴路2号B06厂房1楼
1st floor, B06 building,No.2,Fuxing Road,Zhangjiagang Economic Development Zone, Jiangsu Province 215600 PRC
Url:www.cycas.com
website:en.cycas.com
Because the process variables in plasma etcher process, such as etching rate, pressure, temperature, plasma impedance, etc., are not easy to measure, virtual measurement (Virtual Metrology)
Optical emission spectroscopy
Plasma impedance monitoring
End-point detection
Remote-coupled sensing run-to-run control (R2R)
Model predictive control (MPC)
Artificial neural network control 1. Verify that the multimeter works normally and the range is 200 mV.
2. The cold probe connects the positive electrode of the voltmeter, and the hot probe connects the negative electrode of the voltmeter.
3. Contact a silicon wafer with cold and hot probes at two points which are not connected at the edge. Voltmeter shows that the voltage between these two points is positive, indicating that the conductive type is P-type and the etching is qualified. The same method detects whether the other three edges are P-shaped.
4. If any edge of silicon wafer is not qualified after inspection, the wafers need to be repackaged and etched.