What is intermediate frequency magnetron sputtering?

In IF reactive sputtering, the target surface is sputtered by positive ions when the voltage applied on the target is in negative half cycle, while in positive half cycle, the electrons in the plasma are accelerated to the target surface, neutralizing the positive charges accumulated on the target surface, thus suppressing the firing. However, the higher the frequency, the shorter the acceleration time, the less energy absorbed by the positive electric field from the external electric field, the lower the energy of the positive ions bombarding the target, and the lower the sputtering rate of the target. Because the frequency range of sputtering voltage is in the range of 10-80 KHz, it is also called intermediate frequency sputtering']

Medium frequency sputtering of magnetron sputtering station is often used to sputter two targets, usually two targets side by side, with the same size and shape, so these two targets are often called twin targets. The twin target is suspended in the sputtering chamber. During the sputtering process, the two targets periodically alternate as cathode and anode, which not only suppresses the ignition, but also eliminates the anode disappearance phenomenon in the ordinary DC reactive magnetron sputtering, so that the sputtering process can proceed steadily.